Original Research
Deposition of (Ag,Cu)2Zn(Sn,Ge)S4 thin films on Mo-coated glass substrate by vacuum magnetron sputtering and post-sulfurization techniques
J. X. Xu
a
X. Tian
a

a School of Materials and Energy, Guangdong University of Technology,

Guangzhou 510006, China

b School of Integrated Circuits, Guangdong University of Technology, Guangzhou 510006, China


Journal of Ovonic Research 2022, 18(2),227-238; https://doi.org/10.15251/JOR.2022.182.227
Submitted:Jan 25, 2022
Accepted:Apr 06, 2022
Published:Apr 12, 2022
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Cite This Article
J. X. Xu ,X. Tian . (2022). Journal of Ovonic Research. Deposition of (Ag,Cu)2Zn(Sn,Ge)S4 thin films on Mo-coated glass substrate by vacuum magnetron sputtering and post-sulfurization techniques, 18(2), ,227-238. https://doi.org/10.15251/JOR.2022.182.227
Abstract

Cation substitution is a useful way to improve the properties of semiconducting Cu2ZnSnS4 thin film. In this work, partial Cu and Sn in Cu2ZnSnS4 are substituted by Ag and Ge, respectively. The (Ag,Cu)2Zn(Sn,Ge)S4 thin films were successfully fabricated using vacuum magnetron sputtering and post-sulfurization techniques. The formation of Ag & Ge co-doped Cu2ZnSnS4 structure with secondary phase is proved by XRD and Raman results. The Ag and Ge ratios depend on the composition of Cu-Ag target and the sputtering time of Ge, respectively. The direct optical band gap values of thin films increase with the increase of Ge content. When the sputtering time of Ge is 90 s, the Urbach energy of (Ag,Cu)2Zn(Sn,Ge)S4 thin films reaches the minimum value of 339 meV, revealing the reduced band tail state by Ge incorporation.

©2026 by the authors. Submitted for possible open access publication under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
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