a Department of Physics, Velalar College of Engineering and Technology, Erode-
12, Tamilnadu, India
b Department of Physics, Vellalar College for Women, Erode-12, Tamilnadu,
India
Journal of Ovonic Research 2023, 19(2),231-238; https://doi.org/10.15251/JOR.2023.192.231
The Nickel Manganese Tungsten (Ni-Mn-W) thin films were prepared at different temperature and time of deposition on copper substrate. The crystal structure and morphology of deposits were analysed by X-ray diffraction (XRD) and scanning electron microscopy (SEM). The XRD revealed that the structure of Ni-Mn-W thin films with have an average grain size of about 28 nm for 45oC. The elemental analysis of Ni-Mn-W thin films were obtained by energy dispersive X-ray spectroscopy (EDAX). The magnetic properties of electrodeposited Ni-Mn-W thin films were obtained by vibrating sample magnetometer (VSM). The magnetic parameters of Ni-Mn-W films such as coercivity and saturation magnetization were decreased with increasing of grain size. The hardness of the films was studies by Vicker Hardness tester through diamond intender
method.

