^aDepartment of Physics, Sasurie College of Engineering, Tirupur– 638 056, Tamil Nadu, India

^bDepartment of Basic Engineering - Physics, Sakthi Polytechnic College,

Sakthinagar, Erode -638315, Tamil Nadu, India

^cDepartment of Physics, Erode Sengunthar Engineering College, Erode – 638057, Tamil Nadu, India

^dDepartment of Physics, Kumaraguru College of Technology, Coimbatore 641

049, Tamil Nadu, India

By changing the electroplating deposition duration, such as 15, 30, 45, and 60 minutes, the NiAg thin films have been synthesised by electrodeposition on copper substrate at a uniform current density of 1 A/dm2. The NiAg thin films were adhered to the substrate at a consistent electrolytic solution temperature of 30°C, and the created electrolyte's pH was maintained within a range of 7 to 8. EDAX, XRD, and SEM techniques have all been used to investigate the structural investigation of electrodeposited NiAg thin films. The FCC crystal structure can be seen by the X-ray diffraction analysis pattern, which indicates that the average crystalline size of the NiAg-coated thin films was between 31 and 64 nm.Images of coated thin films taken with a scanning electron microscope show that, even with longer deposition times, the surface morphology of electrodeposited NiAg thin films is consistent. The Vibrating Sample Magnetometer (VSM) examination was used to investigate the magnetic characteristics. With a greater saturation magnetization of 7.6930 × E-3 emu/cm3 and a lower coercivity of 92 Oe, the NiAg film deposited at 15 minutes shows a better soft magnetic nature. According to the electrochemical analyses of plated NiAg thin films, the NiAg film coated at the 60 -minute deposition period showed the lowest corrosion rate, measuring 0.047286 mm/year with a polarization resistance of 3900.9 Ω. NiAg thin films' mechanical and magnetic characteristics make them suitable to produce MEMS and NEMS based devices.