Original Research
RF sputter deposition of amorphous TiOₓ films: role of deposition time
A. H. Hammad
a
A. Jilani
a
A. H. Milyani
b
G. Mousa
d
E. B. Moustafa
d
M. Sh. Abdel-Wahab
e

a Center of Nanotechnology, King Abdulaziz University, Jeddah, 21589, Saudi

Arabia

b Department of Electrical and Computer Engineering, King Abdulaziz University, Jeddah 21589, Saudi Arabia

c Center of excellence in intelligent Engineering Systems (CEIES), King Abdulaziz University, Jeddah 21589, Saudi Arabia

d Department of Mechanical Engineering, Faculty of Engineering, King Abdulaziz University, Jeddah 21589, Saudi Arabia

e Materials Science and Nanotechnology Department, Faculty of Postgraduate

Studies for Advanced Sciences, Beni-Suef University, Beni-Suef, 62511, Egypt


Journal of Ovonic Research 2025, 21(5),513-527; https://doi.org/10.15251/JOR.2025.215.513
Submitted:Jun 30, 2025
Accepted:Sept 04, 2025
Published:Sept 15, 2025
+
Cite This Article
A. H. Hammad ,A. Jilani ,A. H. Milyani ,G. Mousa ,E. B. Moustafa ,M. Sh. Abdel-Wahab . (2025). Journal of Ovonic Research. RF sputter deposition of amorphous TiOₓ films: role of deposition time, 21(5), ,513-527. https://doi.org/10.15251/JOR.2025.215.513
Abstract

Titanium oxide thin films were synthesized using the radio frequency (RF) sputtering technique at varying deposition times ranging from 50 to 125 min. The fabricated films display an amorphous character, with the predominant chemical state of titanium being Ti4+, accompanied by a minor proportion of Ti3+ states. The optical absorption edges shifted to longer wavelengths, increasing from 288 to 293 nm, as the deposition time increased. The optical band gap (Eg) was indirect and decreased from 3.911 to 3.762 eV. The refractive index and dispersion parameters were evaluated and analyzed.

©2026 by the authors. Submitted for possible open access publication under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
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